Fengnian Xia designated the Weller Professor in Engineering and Science
Fengnian Xia, newly named as the Barton L. Weller Assistant Professor in Engineering and Science, researches photonics and electronics using emerging materials such as graphene, transition metal dichalcogenides, and black phosphorus.
Xia’s research group explores the light-matter interaction and quantum transport in these low-dimensional materials and identifies their potential applications in computing, flexible electronics, imaging, optical communications, and energy harvesting. Among other contributions, his team is one of the first to initiate black phosphorus research and propose the possible roles of thin-film phosphorous in future photonics and electronics.
A graduate of Tsinghua University (China), Xia earned his M.A. and Ph.D. from Princeton University. Prior to joining the Yale faculty in 2013, he held research and engineering positions at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York.
Xia has authored or co-authored approximately 70 journal articles and delivered more than 50 plenary and invited talks at universities and major conferences worldwide. He is on the editorial board of Nano Research (Springer and Tsinghua University Press) and is the primary guest editor of the IEEE Journal of Selected Topics of Quantum Electronics. He is a member of the Institute of Electrical and Electronics Engineers (IEEE), the America Physical Society, and the Optical Society of America.
Xia holds 14 U.S. patents and has eight applications pending. His research has been featured by general media outlets such as The Wall Street Journal, Fox News, and Journal News, and reported in scientific journals and media including Nature, Nature Photonics, MIT Technology Review, and IEEE Spectrum, among other publications.
The Yale professor’s honors include the Office of Naval Research Young Investigator Award, the IBM Pat Goldberg Memorial Best Paper Award, the MIT Technology Review TR35 Award, and the IBM Corporate Award, that corporation’s highest technical honor.